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Thin Film Materials, Introduction of Hansol Chemical Thin Film Materials
박막재료 관련 연출 이미지
Product Inquires Data Sheets

CVD/ALD technology plays very important roles in forming nano-meter thin film and filling deep and narrow hole evenly. Applications are expanding in electronic product producing process such as FPD, LED, PV, etc. CVD/ALD process vaporizes precursor substances and undergoes chemical reactions to form metal film, oxidized metal film, nitrified metal film, etc. Hansol Chemical is producing various silicon and metal spheres used in CVD/ALD

Characteristics

제품용도 및 특성 정보
Product name Chemical name Advantage
TSA Trisilylamine SiO2 Gap fill
BDEAS Bisdiethyl aminosilane Low temp SiO2, Si seeding
DIPAS Diisopropylaminosilane Low temp SiO2, Si seeding
HCDS Hexachlorodisilane Spacer
CpCo(CO)2 Cyclopentadienyldicarbonylcobalt Co capping layer
High-k Zirconium, Hafnium, Titanium, Aluminium precursors High-k
3DMAS Tris dimethyl Amino silane Slit SiO2, Tunneling SiO2
WCl5 Tungsten Pentachloride Solid W precursor for seeding
Ruthenium Ex0XRu Series Liquid Ru precursor for ALD process

Contact

담당자 연락처 정보
Name TEL EMAIL
Choi, YongHwan +82-2-2152-2383 yhchoi1@hansol.com
LEE KYUNG SIK +86-135-9044-8039 kslee1@hansol.com
Jung WonHyun + 886-938-430-079 whjung@hansol.com
C.W Chung + 886-912-881-655 cwchung@hansol.com
JAE HEE KIM +82-2-2152-2372 jhkim05@hansol.com
Whee-Won Jin +82-2-2152-2382 hwjin@hansol.com
Joo-Youn Lee +82-2-2152-2309 jy.lee8@hansol.com
Ace +82-2-2152-2382 hkcho@hansol.com
Flynn +82-2-2152-2376 hjlee01@hansol.com
Sandy +82-2-2152-2375 hmkim1@hansol.com
Sarah +82-2-2152-2381 symoon1@hansol.com
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